Rapid Thermal Processing (RTP)

The Levitor RTP-system has reproducible and reliable operation at temperatures ranging from well below 200°C up to 1,200°C. Both the Levitor RTP-system and the Levitrack ALD-system are based on the unique concept of fast heating via conduction rather than the conventional method of radiation heating. In the Levitor RTP system, this technology is used to rapidly heat and cool-down wafers. Heat (energy) is stored in massive blocks in close proximity to the wafer. The wafer is held separate from the blocks by a very thin layer of gas. This gas layer enables a very efficient and extremely fast energy transfer from the blocks to the wafer. These wafers are heated to the required process temperature within a matter of seconds.